Equipment and Services
XPS and UPS spectometer
The AXIS Ultra DLD system is a high performance electron spectrometer combining state of the art XPS functionality, including superior energy resolution and highest sensitivity to analyse the chemical composition of the studied materials surface (2 to 8 nm in depth). Standard features are small spot and parallel imaging XPS, with Ion sputtering and UPS options.
The system is equipped with standard achromatic dual anode Mg Kα(1253.6eV)/Al Kα(1486.6eV) and monochromatic single anode Al Kα(1486.6eV) X-ray sources. For UPS option the system is equipped with a windowless discharge lamp optimised for He (I) (21.2eV) or He (II) (40.8eV) output.
Multiple sample coordinates (maximum sample holder dimensions 130mm long and 15mm width) may be stored and recalled for fully automated sample analysis.
PL system operates at wavelengths 300-3000nm and temperatures 10-300K. Different lasers are available for excitation, among them 100mW He-Cd laser with wavelengths 442 and 325 nm.
µ-Raman spectrometer HORIBA LabRAM 800HR
Micro-Raman spectrometer HORIBA LabRAM 800HR enables to perform measurements in the region 50 cm-1 – 4000 cm-1. Two lasers with wavelengths of 532 nm ja 633 nm can be used for excitation. Following objectives are available: 100x, 50x, 50x LWD, 10x. Temperature dependent measurements can be made from 77 K to 325 K. Equipment enables to perform Raman mapping and micro-photoluminescence measurements in visible spectral region (Si CCD detector).
Capacitance spectroscopy systems Autolab PGSTAT30 and Wayne Kerr 6500B
Autolab PGSTAT30 and Wayne Kerr 6500B are suitable for p-n junction impedance spectroscopy and current-voltage measurements.
Autolab can be used to scan voltage in a range ±10V and measure currents in a range ±1A, and to measure impedance spectroscopy in a frequency range from 10μHz to 1MHz. Autolab offers the possibility to use it as the potentiostat/galvanostat to apply constant potentials and measure currents (or vice versa with galvanostat option).
Wayne Kerr can be used to measure impedance spectroscopy in a frequency range from 20Hz to 10MHz.
Both systems can be used to measure impedance-frequency dependences at a constant potentials (in dependence of temperature T=8-300K to detect the defect energy) or impedance-voltage dependences at a constant frequences (to detect the defect concentrations).
AFM Bruker MultiMode 8 AFM with Application Module based on Nanoscope V controller
MultiMode 8 includes many scanning modes with new features and accessories.
Bruker’s innovative PeakForce Tapping technology has assisted new scanning modes that give information about not only topographic but also electrical and materials properties data in parallel.
MultiMode 8 Specifications:
Scanner Scan size Vertical range
‘E’ 10μm x 10μm 2.5μm
‘J’ 125μm x 125μm 5.0μm
Image Resolution: 512 Lines/pixels
Imaging Noise Level : <0.3Å RMS (Z noise using Tapping Mode in air at zero scan size
Maximum Sample Size: 15mm diameter x 5mm thick
HR-SEM Zeiss FEG-SEM Ultra-55
FEG-SEM thermionic field emission gun SEM
Resolution 1 nm.
SE- secondary electrons
BE- back-scattered electrons
ISE In-lens secondary electrons
IBE- In-lens back-scattered electrons
EBIC- electron beam induced current
EDS energy dispersive X-ray microanalysis, Bruker Esprit 1.8 system, for determination of chemical elements composition and distribution
EBSD electron back-scatter diffraction, Oxford Instruments Channel 5 system, for determination of chemical compounds and their distribution
EDXRF energy dispersive X-ray fluorescence, Bruker EDXRF system, for determination of chemical elements composition and distribution
Devices for samples preparation
Magnetron sputtering device Quorum Q150RS for coating of the samples with conducting Au- Pd layer;
Automatic grinding –polishing machine Buehler Ecomet/Automet 250, for preparation of metallographic cross-sectional polishes;
Vibro-polishing machine Buehler Vibromet for polishing the samples for EBSD analysis;
Precision ion etching coating system Gatan PECS 682 for etching of the samples with Ar ions and for coating of the samples with thin (0,1-10 nm) layers (Au, Pd, Pt, C, etc)
SEM HR-SEM MERLIN
MERLIN with the GEMINI II column combines ultra fast analytics, high resolution imaging using advanced detection modes, and future assured configuration flexibility on one single system.
Thanks to the prealigned GEMINI II optics imaging setting such as voltage or probe current can be seamlessly adjusted across orders of magnitudes to match your application and sample with next to no need for realignment. Even novice users will enjoy optimum results. System optimization for high current density, probe currents up to 300 nA, and superior resolution at high beam currents, guarantees fast results in nano-analytics.
Receive maximum information from your sample with parallel on-axis in-lens secondary electron (SE) and energy selective backscattered (EsB) detection capable of identifying smallest differences in materials composition.
· Ultra high resolution imaging at low kV
· Ideal for precise boundary, feature, and particle measurements
· High efficiency EsB detector for compositional information
· High efficiency In-lens SE detector for high contrast surface imaging
· BSE imaging with the AsB-detector (Angle Selective BSE-Det.) at very short working distances - 1mm WD
· Ultra stable high current mode for x-ray analysis and EBSD applications
· Large five axes motorised eucentric stage
Easy operation through Windows® XP based SmartSEMTM control software
SEM-Raman-CL measurement system Renishaw inVia Raman and Zeiss’s EVO MA10 SEM
Integrated SEM-Raman-CL measurement system combines Renishaw’s in-Via Raman spectrometer and Structural and Chemical Analyzer (SCA), and Zeiss’ s EVO MA10 SEM. The measurement system enables to perform Raman and cathodoluminescence measurements inside SEM. Raman measurements can be performed in the region 100 cm-1 - 4000 cm-1. CL measurements can be perfomed in IR (InGaAs detector) and visible (Si detector) spectral regions. 514 nm laser is used for excitation. The system can be combined also with liquid nitrogen cooling stage.